"What is new in product" news archive

List of product news in dessecending order by obsolescense.

November 25, 2009 Lithographic data export to NPGS format
	Now NanoMaker can export proximity corrected data to NPGS. The new option starts with DXF/GDSII data import and after proximity correction prepares data in RF6 and DC2 formats, which can be seamle...
June 08, 2009 The procedure of resist development simulation was advanced
	The procedure of resist development simulation was advanced. The new parameter - Eta0 (η0) is added to proximity function calculation, allowing to consider dose changes with resist depth.
May 25, 2009 The optional module to calculate proximity function by Monte-Carlo method for multilayered substrates is created
	The optional module to calculate proximity function for multilayered substrates is created. The calculation by Monte-Carlo method takes less then 5 minutes. The calculated distribution of the abso...
March 18, 2009 3D representation of development simulation is realized.
	3D representation of development simulation is realized.
October 24, 2007 NanoMaker data representation format was amended to support 256 layers structures.
	NanoMaker data representation format was amended to support 256 layers structures. Some minor changes were made to minimize size of data files on disk.
June 20, 2007 New Elli29 PCI Pattern Generator board is presented
	New Elli29 PCI is a perfected model of our previous pattern generators. As its predecessors, Elli29 is an advanced data acquisition product with hig...
July 10, 2006 Special software "RainBow" was recently developed for OVD structures data preparation
	Special software "RainBow" was recently developed for OVD structures data preparation. The program outputs data to text file in compact represent...
April 12, 2006 Reference Map element was added to NanoMaker's data file format for compact representation of large OVD objects.
	New element, Reference Map, was added to NanoMaker's data file format (GDB) for compact representation and preparation for writing of large OVD objects, such as
November 06, 2005 A few new procedures were developed to transform lithographic structures
	In addition to existing Numeric Transform a few new procedures were developed to make more flexible the editing of lithographic structures.
July 21, 2005 Image Array Acquisition for large-scale micro objects diagnostics
	Image Array Acquisition procedure was developed. This procedure can be used for creation of high-resolution panoramic view of large-scale micro objects.
March 20, 2005 Dose Stratification was added to list of Postprocessing commands
	Dose Stratification was added to list of Postprocessing commands. The operation stratifies and then combines elements by dose into overlapped areas keeping unchanged total exposure dose for all po...
December 10, 2004 Variable resolution was added to data base editor
	Variable resolution was added to data base editor. Now user can choose practically any data base resolution at design stage in dependence on specific of implementing task.
July 28, 2004 Drift compensation at exposure was added
	Drift compensation at exposure was added. The procedure performs periodically automatic drift compensation at exposure upon request. The compensation should be used at prolonged exposure when dif...
May 10, 2004 New Elli-28 PCI Pattern Generator board is developed
	New Elli-28 PCI Pattern Generator board is created. This an advanced data acquisition product. It features high speed Digital-to- Analogue addressing capabilities and Analog-to-Digital sample conv...