Happy New 2011 year with ion beam lithography!

Yu. Petrov, Prof. O. Vyvenko
Nanotechnology Center, St. Petersburg State University, St. Petersburg, Russia
Equipment: Zeiss Orion helium-ion microscope

Happy New 2011 year with ion beam lithography! The structure was written in 150 nm PMMA at 17 kV acceleration voltage and 0.5 pA ion beam current.

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