There are some essential know-how and advantages which make our product more preferable. Among of them:
excellent and widely published theoretical method applied for development (see White Papers)
real 3D (!) proximity correction and resist development simulation
longtime (more than 18 years) exploitation of the algorithm/software what means long-term testing by tens of users (the development simulation subsystem is the same as in PROXY software)
seamless integration of design and production stages of lithography process
possibility to work without beam blanker
measurement and correction on-fly of dynamic and static errors of deflection system that significantly reduces total exposure time
modern Pattern Generator hardware solution based on two separate devices for significant interference/noise reduction: computer interface PCIe card and standalone unit communicating with a microscope, which are connected with fiber-optic link only
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