NanoMaker Pattern Generation System
The NanoMaker is a powerful lithography system for electron beam and ion
beam lithography using a commercial SEM, FIB or dual beam microscope. The
NanoMaker solutions comprise modern Pattern Generator hardware and versatile
data preparation software which allow both design and nanofabrication. The
product is widely used in university laboratories and research centers.
NanoMaker provides a unique set of tools for nanotechnologies.
It is supplied with friendly graphic editor to design hierarchical
structures of any size and shape arranged to any level of complexity.
This fully functional tool NanoMaker-Editor is free of charge and can
be downloaded and installed on any number of workstations.
Calculates exposure dose values/times considering proximity effect
correction (PEC) for 2D/3D structures.
Allows writing without beam blanking.
Makes predictive simulation of resist development.
Significantly reduces total exposure time by actively suppressing
dynamic delays of beam deflection.
Compensates static distortion of beam deflecting system increasing writing field.
Seamlessly integrates Monte
Carlo calculation to define exposure recommended parameters for
multilayered resist-substrate systems.
Can be used as diagnostic tool for creation of high-resolution panoramic
view of large-scale (centimeters) micro objects.
To convert any scanning electron/ion microscope (SEM/FIB) into a beam lithograph.
To provide an ultimate resolution of lithography (including industrial lithographs). To achieve this:
makes correction for proximity effect during data preparation for lithography
compensates for the distortion and delays of scanning system during exposure
and image acquisition
compensates for the system drift at prolonged exposure
To predict results of lithography by simulating.
To ensure adjustment for various configurations of lithographic equipment,
for the presence or absence of beam blanking systems, stages, etc.
To create three-dimensional structures in a resist.
To familiarize user with the basic principles of lithography through the intuitive interface, logical sequence of operations and a solid theoretical basis.
What is new?
Our article, dedicated to the design and fabrication of digital rainbow holograms using SEM based e-beam lithography,...
The new release of the program is prepared in which the optimization of large blocks of data is made by presenting them as B-trees, that dramatically speeded up the work with large...
A few photos of "deep" X-ray diffraction gratings based on Si (400) crystal were published in our
Scanning Electron Microscope controlled by NanoMaker
3D nano-micro patterning
Diffractive optics (synthetic holograms) for visible and X-ray range
Easily installed on:
SEM's (JEOL, LEO, ZEISS, HITACHI, PHILIPS, FEI, TESCAN,...)
Focused Ion Beam machines
Dual beam microscopes
We think you'll find our product worth examining.
Please feel free to communicate with us if you have any special requirements for your application.