NanoMaker is a powerful software/hardware system for SEM/FIB based
lithography that is intended for state-of-the-art technology of designing
and manufacturing micro and nano electronic devices and objects.
Why NanoMaker?
NanoMaker provides a unique set of tools for nanotechnologies.
It is supplied with friendly graphic editor to design hierarchical
structures of any size and shape arranged to any level of complexity.
Compensates static distortion of e-beam deflecting system.
Significantly reduces total exposure time by actively suppressing
dynamic delays of e-beam deflection.
Allows writing without beam blanking.
Seamlessly integrates Monte
Carlo calculation to define exposure recommended parameters for
multilayered resist-substrate systems.
Can be used as diagnostic tool for creation of high-resolution panoramic
view of large-scale (centimeters) micro objects.
Purposes:
To convert any scanning electron microscope (SEM) into an e-beam lithograph.
To provide an ultimate resolution of lithography with a certain setup (including
industrial lithographs). To achieve this:
make correction for proximity effect during data preparation for lithography
compensate for the distortion and delays of scanning system during exposure
and image acquisition
compensate for the system drift at prolonged exposure
To predict results of lithography by simulating.
To ensure adjustment for various configurations of lithographic equipment,
for the presence or absence of beam blanking systems, stages, etc.
To create three-dimensional structures in a resist.
To familiarize user with the basic principles of lithography through the intuitive interface, logical sequence of operations and a solid theoretical basis.
What is new?
Events:
January, 2013
The efficient software package for the structure design and simulation of imaging properties of diffraction optical elements has been developed. It operates with point source and consists...
March, 2012Press release on joint work on the design, optimization and production of rainbow holograms by KERI, 3SMK (both S Korea), Interface...
February, 2011
NanoMaker was sucessfully hooked on Zeiss Orion helium-ion microscope at the St. Petersburg State University. During installation several tests were carried out to assess the possibilities...
January, 2012
Updated version of the NanoMaker-Editor is available for download in the Download...
January, 2012
The new release of the program is prepared in which the optimization of large blocks of data is made by presenting them as B-trees, that dramatically speeded up the work with large...
Archives
On site:
January, 2012A few photos of nanometer size patterns made with focused helium-ion beam published in our
