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NanoMaker Pattern Generation System

The NanoMaker is a powerful lithography system for electron beam and ion beam lithography using a commercial SEM, FIB or dual beam microscope. The NanoMaker solutions comprise modern Pattern Generator hardware and versatile data preparation software which allow both design and nanofabrication. The product is widely used in university laboratories and research centers.

Why NanoMaker?

NanoMaker provides a unique set of tools for nanotechnologies.
  • It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity. This fully functional tool NanoMaker-Editor is free of charge and can be downloaded and installed on any number of workstations.
  • Calculates exposure dose values/times considering proximity effect correction (PEC) for 2D/3D structures.
  • Allows writing without beam blanking.
  • Makes predictive simulation of resist development.
  • Significantly reduces total exposure time by actively suppressing dynamic delays of beam deflection.
  • Compensates static distortion of beam deflecting system increasing writing field.
  • Seamlessly integrates Monte Carlo calculation to define exposure recommended parameters for multilayered resist-substrate systems.
  • Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects.


  1. To convert any scanning electron/ion microscope (SEM/FIB) into a beam lithograph.
  2. To provide an ultimate resolution of lithography (including industrial lithographs). To achieve this:
    1. makes correction for proximity effect during data preparation for lithography
    2. compensates for the distortion and delays of scanning system during exposure and image acquisition
    3. compensates for the system drift at prolonged exposure

  3. To predict results of lithography by simulating.
  4. To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.
  5. To create three-dimensional structures in a resist.
  6. To familiarize user with the basic principles of lithography through the intuitive interface, logical sequence of operations and a solid theoretical basis.
What is new?
June, 2015 The NanoMaker is exhibited at the 2015 Photonic Festival in Taiwan More...
December, 2014 Our article, dedicated to the design and fabrication of digital rainbow holograms using SEM based e-beam lithography,... More...
April, 2014 Interface Ltd. has signed an agreement with Grapes Hangzhou Technology Co. Ltd to represent the NanoMaker in Chin. The... More...
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In product:
May, 2013 Updated version of the NanoMaker-Editor is available for download in the Download... More...
January, 2012 Updated version of the NanoMaker-Editor is available for download in the Download... More...
January, 2012 The new release of the program is prepared in which the optimization of large blocks of data is made by presenting them as B-trees, that dramatically speeded up the work with large... More...
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On site:
January, 2015 Updated manual on Basic of NanoMaker-Editor is published in the Download section. More...
October, 2014 A few photos of "deep" X-ray diffraction gratings based on Si (400) crystal were published in our More...
December, 2013 Reference to article dedicated to Fabrication of Rainbow Holograms using SEM based e-beam lithography... More...
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SEM controlled by NanoMaker
Scanning Electron Microscope controlled by NanoMaker


  • Microelectronics
  • Nanotechnology, nanophysics
  • 3D nano-micro patterning
  • Diffractive optics (synthetic holograms) for visible and X-ray range
  • Digital microscopy

Easily installed on:

  • Focused Ion Beam machines
  • Dual beam microscopes
We think you'll find our product worth examining. Please feel free to communicate with us if you have any special requirements for your application.
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