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NanoMaker Overview

NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art technology of designing and manufacturing micro and nano electronic devices and objects.

Why NanoMaker?

NanoMaker provides a unique set of tools for nanotechnologies.
  • It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity.
  • Calculates exposure dose values/times considering proximity effect correction for 2D/3D structures.
  • Makes simulation of resist development.
  • Compensates static distortion of e-beam deflecting system.
  • Significantly reduces total exposure time by actively suppressing dynamic delays of e-beam deflection.
  • Allows writing without beam blanking.
  • Seamlessly integrates Monte Carlo calculation to define exposure recommended parameters for multilayered resist-substrate systems.
  • Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects.

Purposes:

  1. To convert any scanning electron microscope (SEM) into an e-beam lithograph.
  2. To provide an ultimate resolution of lithography with a certain setup (including industrial lithographs). To achieve this:
    1. make correction for proximity effect during data preparation for lithography
    2. compensate for the distortion and delays of scanning system during exposure and image acquisition
    3. compensate for the system drift at prolonged exposure

  3. To predict results of lithography by simulating.
  4. To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.
  5. To create three-dimensional structures in a resist.
  6. To familiarize user with the basic principles of lithography through the intuitive interface, logical sequence of operations and a solid theoretical basis.
What is new?
Events:
November, 2013 NanoMaker lithographic system is installed in Research Laboratory of the Rzeszow University (Poland) More...
January, 2013 The efficient software package for the structure design and simulation of imaging properties of diffraction optical elements has been developed. It operates with point source and consists... More...
March, 2012 Press release on joint work on the design, optimization and production of rainbow holograms by KERI, 3SMK (both S Korea), Interface... More...
Archives Follow on to archive...
In product:
May, 2013 Updated version of the NanoMaker-Editor is available for download in the Download... More...
January, 2012 Updated version of the NanoMaker-Editor is available for download in the Download... More...
January, 2012 The new release of the program is prepared in which the optimization of large blocks of data is made by presenting them as B-trees, that dramatically speeded up the work with large... More...
Archives Follow on to archive...
On site:
December, 2013 Reference to article dedicated to Fabrication of Rainbow Holograms using SEM based e-beam lithography... More...
January, 2012 A few photos of nanometer size patterns made with focused helium-ion beam published in our More...
May, 2011 Published Russian-language version of the main sections of the site. More...
Archives Follow on to archive...
SEM controlled by NanoMaker
Scanning Electron Microscope controlled by NanoMaker

Applications

  • Microelectronics
  • Nanotechnology, nanophysics
  • 3D nano-micro patterning
  • Diffractive optics (synthetic holograms) for visible and X-ray range
  • Digital microscopy

Easily installed on:

  • SEM's (JEOL, LEO, ZEISS, HITACHI, PHILIPS, FEI, TESCAN,...)
  • Focused Ion Beam machines
  • STM/AFM's
We think you'll find our product worth examining. Please feel free to communicate with us if you have any special requirements for your application.
                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                   
 
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