NanoMaker is a powerful software/hardware system for SEM/FIB based
lithography that is intended for state-of-the-art technology of designing
and manufacturing micro and nano electronic devices and objects.
NanoMaker provides a unique set of tools for nanotechnologies.
It is supplied with friendly graphic editor to design hierarchical
structures of any size and shape arranged to any level of complexity.
Compensates static distortion of e-beam deflecting system.
Significantly reduces total exposure time by actively suppressing
dynamic delays of e-beam deflection.
Allows writing without beam blanking.
Seamlessly integrates Monte
Carlo calculation to define exposure recommended parameters for
multilayered resist-substrate systems.
Can be used as diagnostic tool for creation of high-resolution panoramic
view of large-scale (centimeters) micro objects.
To convert any scanning electron microscope (SEM) into an e-beam lithograph.
To provide an ultimate resolution of lithography with a certain setup (including
industrial lithographs). To achieve this:
make correction for proximity effect during data preparation for lithography
compensate for the distortion and delays of scanning system during exposure
and image acquisition
compensate for the system drift at prolonged exposure
To predict results of lithography by simulating.
To ensure adjustment for various configurations of lithographic equipment,
for the presence or absence of beam blanking systems, stages, etc.
To create three-dimensional structures in a resist.
To familiarize user with the basic principles of lithography through the intuitive interface, logical sequence of operations and a solid theoretical basis.
What is new?
NanoMaker lithographic system is installed in Research Laboratory of the Rzeszow University (Poland)
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